COŞKUN, B. Et Al. 2016. Investigation of structural and electrical properties of Zirconium dioxide thin films deposited by reactive RF sputtering technique. FERROELECTRICS , vol.502, no.1 , 147-158.

COŞKUN, B., ASAR, T., AKGÜL, Ü., YILDIZ, K., & Atici, Y., (2016). Investigation of structural and electrical properties of Zirconium dioxide thin films deposited by reactive RF sputtering technique. FERROELECTRICS , vol.502, no.1, 147-158.

COŞKUN, BURHAN Et Al. "Investigation of structural and electrical properties of Zirconium dioxide thin films deposited by reactive RF sputtering technique," FERROELECTRICS , vol.502, no.1, 147-158, 2016

COŞKUN, BURHAN Et Al. "Investigation of structural and electrical properties of Zirconium dioxide thin films deposited by reactive RF sputtering technique." FERROELECTRICS , vol.502, no.1, pp.147-158, 2016

COŞKUN, B. Et Al. (2016) . "Investigation of structural and electrical properties of Zirconium dioxide thin films deposited by reactive RF sputtering technique." FERROELECTRICS , vol.502, no.1, pp.147-158.

@article{article, author={BURHAN COŞKUN Et Al. }, title={Investigation of structural and electrical properties of Zirconium dioxide thin films deposited by reactive RF sputtering technique}, journal={FERROELECTRICS}, year=2016, pages={147-158} }