Yueksel, O. F. Et Al. 2008. High frequency characteristics of tin oxide thin films on Si. VACUUM , vol.82, no.11 , 1183-1186.

Yueksel, O. F., Ocak, S., & Selcuk, A. B., (2008). High frequency characteristics of tin oxide thin films on Si. VACUUM , vol.82, no.11, 1183-1186.

Yueksel, Oe., SEMA BİLGE OCAK, And A. B. Selcuk. "High frequency characteristics of tin oxide thin films on Si," VACUUM , vol.82, no.11, 1183-1186, 2008

Yueksel, Oe. F. Et Al. "High frequency characteristics of tin oxide thin films on Si." VACUUM , vol.82, no.11, pp.1183-1186, 2008

Yueksel, O. F. Ocak, S. And Selcuk, A. B. (2008) . "High frequency characteristics of tin oxide thin films on Si." VACUUM , vol.82, no.11, pp.1183-1186.

@article{article, author={Oe. Faruk Yueksel Et Al. }, title={High frequency characteristics of tin oxide thin films on Si}, journal={VACUUM}, year=2008, pages={1183-1186} }