Kupa, I. Et Al. 2018. Optical, Electrical, and Crystal Properties of TiO2 Thin Films Grown by Atomic Layer Deposition on Silicon and Glass Substrates. JOURNAL OF ELECTRONIC MATERIALS , vol.47, no.8 , 4502-4507.

Kupa, I., Unal, Y., Cetin, S. Ş., Durna, L., Topalli, K., Okyay, A. K., ... ATEŞ, H.(2018). Optical, Electrical, and Crystal Properties of TiO2 Thin Films Grown by Atomic Layer Deposition on Silicon and Glass Substrates. JOURNAL OF ELECTRONIC MATERIALS , vol.47, no.8, 4502-4507.

Kupa, I. Et Al. "Optical, Electrical, and Crystal Properties of TiO2 Thin Films Grown by Atomic Layer Deposition on Silicon and Glass Substrates," JOURNAL OF ELECTRONIC MATERIALS , vol.47, no.8, 4502-4507, 2018

Kupa, I. Et Al. "Optical, Electrical, and Crystal Properties of TiO2 Thin Films Grown by Atomic Layer Deposition on Silicon and Glass Substrates." JOURNAL OF ELECTRONIC MATERIALS , vol.47, no.8, pp.4502-4507, 2018

Kupa, I. Et Al. (2018) . "Optical, Electrical, and Crystal Properties of TiO2 Thin Films Grown by Atomic Layer Deposition on Silicon and Glass Substrates." JOURNAL OF ELECTRONIC MATERIALS , vol.47, no.8, pp.4502-4507.

@article{article, author={I. Kupa Et Al. }, title={Optical, Electrical, and Crystal Properties of TiO2 Thin Films Grown by Atomic Layer Deposition on Silicon and Glass Substrates}, journal={JOURNAL OF ELECTRONIC MATERIALS}, year=2018, pages={4502-4507} }