Arslan, B. Et Al. 2021. Comparison of dielectric characteristics for metal-semiconductor structures fabricated with different interlayers thicknesses. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS , vol.32, no.22 , 26700-26708.

Arslan, B., Tan, S. O., Tecimer, H., & ALTINDAL, Ş., (2021). Comparison of dielectric characteristics for metal-semiconductor structures fabricated with different interlayers thicknesses. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS , vol.32, no.22, 26700-26708.

Arslan, Bilal Et Al. "Comparison of dielectric characteristics for metal-semiconductor structures fabricated with different interlayers thicknesses," JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS , vol.32, no.22, 26700-26708, 2021

Arslan, Bilal Et Al. "Comparison of dielectric characteristics for metal-semiconductor structures fabricated with different interlayers thicknesses." JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS , vol.32, no.22, pp.26700-26708, 2021

Arslan, B. Et Al. (2021) . "Comparison of dielectric characteristics for metal-semiconductor structures fabricated with different interlayers thicknesses." JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS , vol.32, no.22, pp.26700-26708.

@article{article, author={Bilal Arslan Et Al. }, title={Comparison of dielectric characteristics for metal-semiconductor structures fabricated with different interlayers thicknesses}, journal={JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS}, year=2021, pages={26700-26708} }