Corekci, S. Et Al. 2012. The influence of thickness and ammonia flow rate on the properties of AlN layers. Materials Science in Semiconductor Processing , vol.15 , 32-36.

Corekci, S., Ozturk, M. K., Çakmak, M., Ozcelik, S., & Ozbay, E., (2012). The influence of thickness and ammonia flow rate on the properties of AlN layers. Materials Science in Semiconductor Processing , vol.15, 32-36.

Corekci, S. Et Al. "The influence of thickness and ammonia flow rate on the properties of AlN layers," Materials Science in Semiconductor Processing , vol.15, 32-36, 2012

Corekci, S. Et Al. "The influence of thickness and ammonia flow rate on the properties of AlN layers." Materials Science in Semiconductor Processing , vol.15, pp.32-36, 2012

Corekci, S. Et Al. (2012) . "The influence of thickness and ammonia flow rate on the properties of AlN layers." Materials Science in Semiconductor Processing , vol.15, pp.32-36.

@article{article, author={S. Corekci Et Al. }, title={The influence of thickness and ammonia flow rate on the properties of AlN layers}, journal={Materials Science in Semiconductor Processing}, year=2012, pages={32-36} }