H. TECİMER Et Al. , "A comparative electric and dielectric properties of Al/p-Si structures with undoped and Co-doped interfacial PVA layer," MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING , vol.28, pp.26-30, 2014
TECİMER, H. Et Al. 2014. A comparative electric and dielectric properties of Al/p-Si structures with undoped and Co-doped interfacial PVA layer. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING , vol.28 , 26-30.
TECİMER, H., TECİMER, H., TECİMER, H., & TECİMER, H., (2014). A comparative electric and dielectric properties of Al/p-Si structures with undoped and Co-doped interfacial PVA layer. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING , vol.28, 26-30.
TECİMER, HÜSEYİN Et Al. "A comparative electric and dielectric properties of Al/p-Si structures with undoped and Co-doped interfacial PVA layer," MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING , vol.28, 26-30, 2014
TECİMER, HÜSEYİN Et Al. "A comparative electric and dielectric properties of Al/p-Si structures with undoped and Co-doped interfacial PVA layer." MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING , vol.28, pp.26-30, 2014
TECİMER, H. Et Al. (2014) . "A comparative electric and dielectric properties of Al/p-Si structures with undoped and Co-doped interfacial PVA layer." MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING , vol.28, pp.26-30.
@article{article, author={HÜSEYİN TECİMER Et Al. }, title={A comparative electric and dielectric properties of Al/p-Si structures with undoped and Co-doped interfacial PVA layer}, journal={MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING}, year=2014, pages={26-30} }