Thesis Type: Postgraduate
Institution Of The Thesis: Gazi Üniversitesi, Fen Bilimleri Enstitüsü, Turkey
Approval Date: 2013
Student: NEVİN DEMİREL
Supervisor: SELİM ACAR
Open Archive Collection: AVESIS Open Access Collection
Abstract:In this study, Al/Al2O3/p-Si structure was made in by atomic layer deposition (ALD) method. The temperature dependent electrical characterization of produced sample was performed in gas atmosphere (carbon monoxide and carbon dioxide) at different temperatures (350 K-375 K-400 K and 450 K) and different gas concentrations (2000 ppm-1000 ppm-500 ppm-250 ppm-125 ppm-50 ppm). While CO and CO2 gas concentrations increases, sensitivities increases for both gases. Gas concentration of 2000 ppm, a maximum sensitivity was obtained in both gas. Increase in sensitivity occurred with increasing temperature. It was observed that the most acceptable working temperature was 450 K for both gas. In this temperature point, sensitivities for CO gas and CO2 gas were determined 19% and 28%, respectively.