Solid State Communications, cilt.403, 2025 (SCI-Expanded)
MgO films were deposited on a glass substrate using a spray coating method and annealed to obtain pure MgO phase. The films were characterized by XRD, AFM and UV–Vis spectrophotometry. XRD results showed a well-defined crystal structure with peaks corresponding to the (111), (200) and (220) orientations, with a crystallite size of 35.21 nm. AFM analysis revealed a rough surface morphology suitable for sensor and photocatalytic applications. Optical characterization revealed a transmittance (∼65 %) in the visible region and an optical band gap of 3.93 eV, making this material promising for optoelectronic devices. The extracted barrier height and ideality factor for the Al/MgO/p-Si (MIS) diode were 0.894 ± 0.050 eV and 1.454 ± 0.080, respectively. These findings suggest that the MgO layer significantly affects the electrical/optical properties of the diode, offering improved performance in electronic and optoelectronic applications.