In this study, the processes of back diffusion in Ar subjected to crossed fields are analyzed by using the Monte Carlo simulation method in the E/N range of 50 to 500 Td (1 Td = 1 x 10(-17) V cm(2)) for 0 < B/N < 25 x 10(-19) T cm(3). At a given constant E/N, escape factors decrease with an increasing crossed, reduced magnetic field B/N. This reduction in the escape factor is more pronounced in the lower E/N range. Furthermore, the mean number of collisions of back scattered electrons is quite large, and at a given E/N, the mean number of collisions decreases as the crossed B/N increases. Published by AIP Publishing.