Effects of Thermal Annealing and Film Thickness on the Structural and Morphological Properties of Titanium Dioxide Films

Corekci S., Kizilkaya K., Asar T., Ozturk M. K. , ÇAKMAK M., Ozcelik S.

ACTA PHYSICA POLONICA A, vol.121, no.1, pp.247-248, 2012 (Peer-Reviewed Journal) identifier identifier

  • Publication Type: Article / Article
  • Volume: 121 Issue: 1
  • Publication Date: 2012
  • Doi Number: 10.12693/aphyspola.121.247
  • Journal Indexes: Science Citation Index Expanded, Scopus
  • Page Numbers: pp.247-248


Titanium dioxide (TiO2) thin films having different thicknesses of 220, 260, and 300 nm were deposited onto well-cleaned n-type silicon substrates by reactive DC magnetron sputtering and annealed in the range of 200-1000 degrees C in steps of 200 degrees C. The effects of thermal annealing and thickness variation on the crystalline quality and surface morphology of the films were investigated by X-ray diffraction and atomic force microscopy measurements. It was found that the film quality and morphology depend on the annealing temperature. TiO2 films exhibit a grain-like surface morphology. The root-mean-square roughness and grain size on the surface increase as a result of increasing film thickness.