Effects of Thermal Annealing and Film Thickness on the Structural and Morphological Properties of Titanium Dioxide Films


Corekci S., Kizilkaya K., Asar T., Ozturk M. K. , ÇAKMAK M. , Ozcelik S.

ACTA PHYSICA POLONICA A, cilt.121, sa.1, ss.247-248, 2012 (SCI İndekslerine Giren Dergi) identifier identifier

  • Cilt numarası: 121 Konu: 1
  • Basım Tarihi: 2012
  • Doi Numarası: 10.12693/aphyspola.121.247
  • Dergi Adı: ACTA PHYSICA POLONICA A
  • Sayfa Sayıları: ss.247-248

Özet

Titanium dioxide (TiO2) thin films having different thicknesses of 220, 260, and 300 nm were deposited onto well-cleaned n-type silicon substrates by reactive DC magnetron sputtering and annealed in the range of 200-1000 degrees C in steps of 200 degrees C. The effects of thermal annealing and thickness variation on the crystalline quality and surface morphology of the films were investigated by X-ray diffraction and atomic force microscopy measurements. It was found that the film quality and morphology depend on the annealing temperature. TiO2 films exhibit a grain-like surface morphology. The root-mean-square roughness and grain size on the surface increase as a result of increasing film thickness.