The frequency and voltage dependent electrical characteristics of Al-TiW-Pd2Si/n-Si structure using I-V, C-V and G/omega-V measurements

Afandiyeva I. M., Doekme İ., Altindal Ş., Abdullayeva L. K., Askerov S. G.

MICROELECTRONIC ENGINEERING, vol.85, no.2, pp.365-370, 2008 (SCI-Expanded) identifier identifier

  • Publication Type: Article / Article
  • Volume: 85 Issue: 2
  • Publication Date: 2008
  • Doi Number: 10.1016/j.mee.2007.07.010
  • Journal Name: MICROELECTRONIC ENGINEERING
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Page Numbers: pp.365-370
  • Keywords: MS structure, frequency dependent, interface states, series resistance, Pd2Si/n-Si contacts, SCHOTTKY-BARRIER DIODES, INTERFACE STATES, SEMICONDUCTOR STRUCTURES, CAPACITANCE, CONDUCTANCE, TEMPERATURE, SILICON, PARAMETERS, HEIGHTS, TRAPS
  • Gazi University Affiliated: Yes

Abstract

The forward and reverse bias capacitance-voltage (C V) and conductance-voltage (G/w-V) characteristics of Al-TiW-Pd2Si/n-Si structures have been investigated over a wide frequency range of 5 kHz-5 MHz. These measurements allow to us the determination of the interface states density (N-ss) and series resistance (R-s) distribution profile. The effect of R-s on C and G is found noticeable at high frequencies. The C-V-f and G/w-V-f characteristics of studied structures show fairly large frequency dispersion especially at low frequencies due to N-ss in equilibrium with the semiconductor. The N-ss profile was obtained both forward bias current-voltage (I-V) characteristics by using into account the bias dependent of the ideality factor and effective barrier height (Phi(e)) and low frequency (C-LF)-high frequency method. The plot of series resistance vs. voltage for the low frequencies gives a peak, decreasing with increasing frequencies. The frequency dependent C-V and G/w-V characteristics confirm that the R, and N-ss of the Al-TiW-Pd2Si/n-Si structures are important parameters that strongly influence the electric parameters in device. (c) 2007 Elsevier B.V. All rights reserved.