Journal of Materials Science: Materials in Electronics, cilt.36, sa.17, 2025 (SCI-Expanded)
In this research, the n-Si wafer is used to generate Au/n-Si (C0), Au/PVC/n-Si (C1), and Au/PVC: Molybdenum (Mo)/n-Si (C2) structures to examine the effects of PVC and PVC:Mo interlayers on the electrophysical characteristics of Schottky barrier diodes (SBDs). The mean crystallite size of the Mo nanostructure is computed by X-ray diffraction (XRD) spectroscopy. The I-V data is used to derive the electrical properties of these structures. These diodes’ current conduction mechanisms (CCMs) and energy-dependent distributions of surface states (Nss) are obtained. By reducing the ideality factor (n), series resistance (Rs), Nss, and leakage current (I0), as well as raising Rsh together with barrier height (BH), the usage of PVC and Mo-doped PVC interfacial polymer layers improves the performance of SBDs. Capacitance/conductance-frequency (C/G-f) measurements are used to study the dielectric constant (ε′)/loss (ε′′) and ac electrical conductivity (σac) in a wide frequency range. The negative capacitance/dielectric origin at low frequencies is thoroughly discussed.