Fabrication and Characterization of Silicon Nitride ThinFilms by Plasma Enhancement Chemical VapourDeposition PECVD
World Conference on Technology, Innovation and Entrepreneurship, 28 - 31 Mayıs 2015, (Özet Bildiri)
- Yayın Türü: Bildiri / Özet Bildiri
- Gazi Üniversitesi Adresli: Evet