The source of negative capacitance and anomalous peak in the forward bias capacitance-voltage in Cr/p-si Schottky barrier diodes (SBDs)


Bilkan C., Gumus A., Altmdal S.

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, cilt.39, ss.484-491, 2015 (SCI İndekslerine Giren Dergi) identifier identifier

  • Cilt numarası: 39
  • Basım Tarihi: 2015
  • Doi Numarası: 10.1016/j.mssp.2015.05.044
  • Dergi Adı: MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
  • Sayfa Sayıları: ss.484-491

Özet

The frequency and voltage dependence of capacitance voltage (C-V) and conductance-voltage (G/w-V) characteristics of the Cr/p-Si metal semiconductor (MS) Schottky barrier diodes (SBDs) were investigated in the frequency and applied bias voltage ranges of 10 kHz to 5 MHz and (-4 V)-(+4 V), respectively, at room temperature. The effects of series resistance (R-S) and density distribution of interface states (N-SS), both on C-V and G/w-V characteristics were examined in detail. It was found that capacitance and conductance, both, are strong functions of frequency and applied bias voltage. In addition, both a strong negative capacitance (NC) and an anomalous peak behavior were observed in the forward bias C-V plots for each frequency. Contrary to the behavior of capacitance, conductance increased with the increasing applied bias voltage and there happened a rapid increase in conductance in the accumulation region for each frequency. The extra-large NC in SBD is a result of the existence of R-S, N-SS and interfacial layer (native or deposited). In addition, to explain the NC behavior in the forward bias region, we drew the C-I and G/w-I plots for various frequencies at the same bias voltage. The values of C decrease with increasing frequency at forward bias voltages and this decrease in the NC corresponds to an increase in conductance. The values of N-SS were obtained using a Hill-Coleman method for each frequency and it exhibited a peak behavior at about 30 kHz. The voltage dependent profile of R-S was also obtained using a Nicollian and Brews methods. (C) 2015 Elsevier Ltd. All rights reserved.