Current transport in Zn/p-Si(100) Schottky barrier diodes at high temperatures

Karatas S., Altindal Ş. , Cakar M.

PHYSICA B-CONDENSED MATTER, cilt.357, ss.386-397, 2005 (SCI İndekslerine Giren Dergi) identifier identifier

  • Cilt numarası: 357
  • Basım Tarihi: 2005
  • Doi Numarası: 10.1016/j.physb.2004.12.003
  • Sayfa Sayıları: ss.386-397


In this study, we have performed behavior of the non-ideal forward bias current-voltage (I-V) and the reverse bias capacitance-voltage (C-V) characteristics of Zn/p-Si (metal-semiconductor) Schottky barrier diode (SBDs) with thin interfacial insulator layer. The forward bias I-V and reverse bias C-V characteristics of SBDs have been studied at the temperatures range of 300-400 K. SBD parameters such as ideality factor n, the series resistance (R-S) determined Cheung's functions and Schottky barrier height, Phi(b), are investigated as functions of temperature. The ideality factor n and R-S were strongly temperature dependent and changed linearly with temperature and inverse temperature, respectively. The zero-bias barrier heights Phi(b0)(I-V) calculated from I V measurements show an unusual behavior that it was found to increase linearly with the increasing temperature. However, the barrier height Ob(C-V) calculated from C-V measurements at 500 kHz frequency decreased linearly with the increasing temperature. The correlation between Phi(b0)(I-V) and Phi(b)(C-V) barrier heights have been explained by taking into account ideality factors n and the tunneling factor (a(chi)(1/2)delta) in the current transport mechanism. Also, the temperature dependence of energy distribution of interface state density (N-SS) was determined from the forward I-V measurements by taking into account the bias dependence of the effective barrier height. The higher values of n and R-S were attributed to the presence of a native insulator on Si surface and to high density of interface states localized at semi conductor-native oxide layer (Si/SiO2) interface. (c) 2004 Elsevier B.V. All rights reserved.