Akademik Veri Yönetim Sistemi
ICMATSE, Ankara, Türkiye, 24 Ekim - 26 Aralık 2024, ss.194-195, (Özet Bildiri)
Thin films are defined as deposited materials on different kind of substrates with different techniques. Some semiconductor materials such as TiO2, ZnO, SiO2, CdS, WO3 are suitable for thin film deposition. In this experimental study, TiO2 (titanium dioxide) is used as a main semiconductor material. In ultrasonic spray pyrolysis deposition (USPD) which is one of the thin film production techniques, requires a liquid solution for deposition to substrate. In the solution with titanium isopropoxide, the other materials are acetylacetone and ethanol. In liquid form of titanium isopropoxide and acetylacetone, mixing with ethanol and in this way the solution is prepared. The solution sprayed in ultrasonic spray pyrolysis machine onto Corning-glass substrate. With this process, solution gets to film from liquid form. This study aims that evaluate the phase transformation behaviors inside a thin film as a result of thermal treatment.