EFFECT OF HELIUM RATIO ON ICP CHARACTERISTICS IN A LOW PRESSURE ARGON PLASMA


Gürsoy T., Yücel H. H., Karaoğlu Y. M., Utaş S.

6. Uluslararası İstanbul Modern Bilimsel Araştırmalar Kongresi, İstanbul, Turkey, 4 - 07 July 2024, pp.3-5

  • Publication Type: Conference Paper / Summary Text
  • City: İstanbul
  • Country: Turkey
  • Page Numbers: pp.3-5
  • Gazi University Affiliated: Yes

Abstract

Inductively coupled radiofrequency (RF) plasma for Argon-He gas mixture has been operated at different gas concentrations. A high density inductively coupled plasma is studied at pressures between 1 Torr and 4 Torr which enables to compute the neutral gas temperature and flow fields as well as all the other components which create the plasma at different axial positions. It is a high-density plasma production technique based on the principle that the changing magnetic field with the effect of electromagnetic induction creates a changing electric field inside the cell and therefore a changing plasma current. Surface: Magnetic flux density norm (T), surface velocity magnitude (m/s), pressure (Pa), thermal conductivity, capacitive power deposition, migrative electron flux and electron densitiy have been calculated for low pressure values. The electron temperature is found to increase with increasing He concentration and as well as the plasma stability with increasing He ratio. Figure 1 shows 2D temperature distribution for Argon-He gas mixture for 1E-5 s. The electron temperature has core value which is donated by red colour in the temperature map around 326 K at 1E-5 s. Using mixture of Argon- He gases dominate the plasma characteristics that contains many active species.