Measurement of sample thickness by an intensity ratio method

Ekinci N., Oz E. , Kurucu Y., Sahin Y.

INSTRUMENTATION SCIENCE & TECHNOLOGY, cilt.29, ss.145-151, 2001 (SCI İndekslerine Giren Dergi) identifier identifier

  • Cilt numarası: 29 Konu: 2
  • Basım Tarihi: 2001
  • Doi Numarası: 10.1081/ci-100103462
  • Sayfa Sayıları: ss.145-151


The thickness measurement of Sn, Ni, and In, evaporated on a Cu substrate is described by means of an intensity ratio method. The detected lines consist of the Ka and KP x-rays of the Cu substrate. An Am-241 point source and Si(Li) detector with resolution of 160 eV at 5.9 keV were used to excite characteristic K x-rays from copper and to provide the acquisition of the photons, respectively. The obtained results show that the nondestructive estimate of an unknown coating thickness is very quick and easy by means of the intensity ratio method.