Akademik Veri Yönetim Sistemi
JOURNAL OF POLYTECHNIC-POLITEKNIK DERGISI, 2024 (ESCI)
Titanium nitride (TiN), titanium oxide (TiO) and titanium oxynitride (TiO x N y ) thin films were grown on soda lime glass (SLG), pure silicon (i-Si) and 316L stainless steel (316LSS) substrates using the sputtering technique with confocal geometry. In order to improve the physical properties of the films obtained, they were subjected to heat treatment at different temperatures in a diffusion furnace and the effect of annealing temperature on the optical, surface and structural properties of the films was investigated. Optical properties of TiN, TiO, TiO x N y thin films were determined by Attenuated Total Reflection (ATR), Fourier transform infrared spectroscopy (FTIR), structural properties were determined by X-ray diffraction diffractometer (XRD), and surface properties were determined by atomic force microscopy (AFM). According to the results obtained from the analyses, annealing temperature improved the physical properties of TiN, TiO, TiO x N y thin films .