Back Diffusion of Electrons in Ar, SF6, and Ar + SF6 Binary Mixtures


Dincer M. S. , ÖZERDEM Ö. C. , Bektas S.

IEEE TRANSACTIONS ON PLASMA SCIENCE, vol.38, no.3, pp.469-473, 2010 (Journal Indexed in SCI) identifier identifier

  • Publication Type: Article / Article
  • Volume: 38 Issue: 3
  • Publication Date: 2010
  • Doi Number: 10.1109/tps.2009.2039945
  • Title of Journal : IEEE TRANSACTIONS ON PLASMA SCIENCE
  • Page Numbers: pp.469-473

Abstract

The back diffusion processes in Ar, SF6, and Ar + SF6 binary mixtures are analyzed by a Monte Carlo simulation method employing realistic collision cross sections of the respective component gases in the E/N range from 50 to 500 Td. The escape factors in pure Ar are always higher than that of those in pure SF6, and as the SF6 content in the binary mixture increases, the escape factors decrease accordingly. Furthermore, the number of collisions observed for the backscattered electrons before returning to cathode in SF6 are smaller than that of those in Ar, and as the SF6 content in the binary mixture increases, the mean number of collisions of the backscattered electrons decrease accordingly.