Atomic Layer Deposition in Thin Film Coatings: A Scientific Review of Applications in Defense, Medicine, and Electronics-Keynote
World Conference on Hybrid Materials: Micro and Nano Length Scales (WCHM 2026), Alappuzha, Hindistan, 13 - 15 Mart 2026, ss.44, (Özet Bildiri)
- Yayın Türü: Bildiri / Özet Bildiri
- Basıldığı Şehir: Alappuzha
- Basıldığı Ülke: Hindistan
- Sayfa Sayıları: ss.44
- Gazi Üniversitesi Adresli: Evet
Özet
Atomic Layer Deposition (ALD) has emerged as a technique that provides nanometer-scale precision in thin film coatings and offers unique control over material properties. This review/keynote explores the current and future applications of ALD in defense, medical, and electronics sectors, highlighting its role as a cornerstone of advanced technologies and shedding light on the development of new materials and products. To date, ALD has, for example, increased the durability and corrosion resistance of materials in military equipment in the defense industry, while also improving the performance of optical and sensor systems. In medicine, ALD coatings contribute to safer, more functional implants by enabling the production of biocompatible materials and allowing controlled drug release through engineered thin films. In electronics, particularly in semiconductor manufacturing, ALD facilitates the deposition of ultra-thin dielectric layers with exceptional homogeneity, thereby increasing device efficiency and speed. These examples demonstrate that ALD is not only an integral part of existing technologies but also plays a crucial role in developing next-generation multifunctional materials. This technique, which provides atomic-level precision, offers a strategic advantage in designing coatings that meet the evolving demands of interdisciplinary innovation.