Grain Boundary Related Electrical Transport in Al-rich AlxGa1-xN Layers Grown by Metal-Organic Chemical Vapor Deposition


Creative Commons License

Yildiz A., Tasli P., Sarikavak B. , Lisesivdin S. B. , Ozturk M. K. , Kasap M. , ...Daha Fazla

SEMICONDUCTORS, cilt.45, sa.1, ss.33-36, 2011 (SCI İndekslerine Giren Dergi) identifier identifier

  • Cilt numarası: 45 Konu: 1
  • Basım Tarihi: 2011
  • Doi Numarası: 10.1134/s1063782611010234
  • Dergi Adı: SEMICONDUCTORS
  • Sayfa Sayıları: ss.33-36

Özet

Electrical transport data for Al-rich AlGaN layers grown by metal-organic chemical vapor deposition (MOCVD) are presented and analyzed in the temperature range 135-300 K. The temperature dependence of electrical conductivity indicated that conductivity in the films was controlled by potential barriers caused by carrier depletion at grain boundaries in the material. The Seto's grain boundary model provided a complete framework for understanding of the conductivity behavior. Various electrical parameters of the present samples such as grain boundary potential, donor concentration, surface trap density, and Debye screening length were extracted.