The analysis of Au/TiO2/n-Si schottky barrier diode at high temperatures using I-V characteristics

Kınacı B., Asar T., Özen Y. , Ozcelik S.

Optoelectronics and Advanced Materials, Rapid Communications, vol.5, pp.434-437, 2011 (Journal Indexed in SCI Expanded) identifier identifier

  • Publication Type: Article / Article
  • Volume: 5
  • Publication Date: 2011
  • Title of Journal : Optoelectronics and Advanced Materials, Rapid Communications
  • Page Numbers: pp.434-437


In this study, the current-voltage (I-V) characteristics of Au/TiO2/n-Si Schottky barrier diodes (SBDs) were examined at high temperatures. TiO2 thin films were deposited on polycrystalline n-type Silicon (Si) substrate using DC magnetron sputtering system. In order to improve the crystal quality, thermal anneling process were done at 700 °C. The electrical parameters such as barrier height (Φb), ideality factor (n) and series resistance (Rs) of Au/TiO2/n-Si SBDs have been investigated by using forward and reverse bias I-V measurements in the temperature range of 340-400 K by steps of 20 K. Also, the values of Rs and Φb were determined by using Cheung's and Norde methods. It was seen that there was a good agreement between the values of Rs and Φb obtained from the forward bias In(I-V) curves by applying Cheung's and Norde methods.